Friday, January 28, 2000
4:00 PM
Physics Building, Room 204
Note special time.

 Add to your calendar

"New Techniques For Nanoscale Fabrication And Characterization"

Robert Hull , Dept. Materials Science and Engineering, UVA
[Host: Joseph Poon]
The gallium focused ion beam produces highly collimated (10 nm - 1(mu)m) beams of high energy (3 - 30 kV) ions. These beams may be used as nanoscale “scalpels” to micromachine virtually any material by direct sputtering of the target surface. Combined with ion-beam induced deposition from organic vapors, this provides unique capabilities for sub 100 nm fabrication of three dimensional structures. I will describe how these capabilities form the basis of a new “nanoprinting” technology, for deep sub-micron pattern definition over planar and curved surfaces. In addition, imaging and spectroscopy in the focused ion beam system enables new routes for three-dimensional characterization and visualization of microscale structures. During sputtering by the primary beam, large numbers of secondary electrons and ions are produced, which may be used to form images of the sputtered surface. By concatenating images of surfaces at different depths during the sputtering process, three-dimensional reconstructions of the structure may be generated. These reconstructions can contain up to 107 independent pixels of information. Furthermore, using a quadrupole mass spectrometer, element-specific images may be obtained. These techniques enable “miroscopy in the third dimension” which can be of immediate and powerful impact in understanding material microstructure.

To add a speaker, send an email to phys-speakers@Virginia.EDU. Please include the seminar type (e.g. Colloquia), date, name of the speaker, title of talk, and an abstract (if available).